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Global Complex Oxide Sputtering Target Market Size to grow USD 6.7 Bn in 2028

The Global Complex Oxide Sputtering Target Market Size was valued at USD 2.2 Bn in 2021. The market is projected to grow USD 6.7 Bn in 2028, at a CAGR of 5.5%.

Global Complex Oxide Sputtering Target Market Size to grow USD 6.7 Bn in 2028

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A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. Arc-melting or radio-frequency melting of a mixture of metals in a vacuum or inert-gas atmosphere can easily produce multielemental alloy sputtering targets.


COVID-19 ANALYSIS

The COVID-19 outbreak has impacted negatively on the semiconductor industry's ecosystem, which is built on a complex web of interconnections between suppliers and end customers of high-tech services. Companies in the sputtering target market are proving robust to these challenges by focusing on areas with low or no negative impact, including as optical communication, data centers, and wireless communications. The outbreak's consequences and impact are expected to intensify in the coming months as the virus spreads. Several governments of few countries are considering national-level lockdowns as a viable means of controlling viral transmission. The outbreak of Covid-19 has forced governments around the world to deploy severe rules such as lockdown, temporary shutdown, social distancing, caused disruption in production of raw materials and in turn increased costing of raw materials. Shipments of raw materials, as well as revenue produced have fallen. Furthermore, insufficient raw material supply will limit the rate of uninsulated conductor, influencing the management of the uninsulated conductor supply chain. The unanticipated increase in demand for beverages has boosted the global complex oxide sputtering target market.

Global Complex Oxide Sputtering Target Market Size

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Companies in the sputtering target market are increasing their production capacity for optical film goods. JX Nippon Mining & Metals, a provider of consumable electronic materials, is increasing production of sputtering targets for optical films used to make Blue-ray Discs, DVDs, and other optical discs. Stakeholders in the sputtering target market are recognizing the value of R&D in developing goods that meet consumer needs in terms of environmental resistance, refractive index, thermal conductivity, and other factors. Optical disc material innovations are being applied to a wide range of optical devices, including OLED (Organic Light-Emitting Diode) screens, optical films, and optical sensors. Manufacturers are honing their quality-control skills in order to provide sputtering targets.


Manufacturers produce increased sputtering targets using sintering technology such as sintered glass and thoroughly treated glass. Sintering is the process of compacting and producing a solid mass of material without melting it to the point of liquefaction using heat or pressure. Deep-glass firms and glass producers, in particular, are focusing on expanding their coated glass manufacturing lines. In the electronics business, precious metal thin film materials made with sintering technique are highly valued, notably in the semiconductor and magnetic disc industries. The sputtering target market is being pushed by an increase in coating demand as a result of the adoption of new technologies. Moreover, over the forecast period, the worldwide sputtering target market is likely to be driven by an increase in research and development spending to create innovative products.


The microelectronic target segment has dominated the market share in 2020 owing to achieve homogeneous thin film coatings, each thin film coating application requires a unique combination of technique and material. The source material is precisely designed with a precise alloy composition, refined grain size, and consistent phase content to ensure coatings with predictable, repeatable qualities. The semiconductors held the largest market share of the global complex oxide sputtering target market attributing to the increasing number of electronics manufacturer and in turn growing usage of smartphones which is fueling the growth of the global complex oxide sputtering target market.

Global Complex Oxide Sputtering Target Market Size

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North America region is dominating the market share of global complex oxide sputtering target market owing to the high product demand in major end-use industries coupled with the presence of key market players such as American Elements (US) and ASM International (US). However, Asia Pacific is expected to witness highest growth rate during the forecast period of complex oxide sputtering target market due to the rising population and urbanization activities. Rising industrial growth, environmental concerns, increased disposable income, and increasing adoption of complex oxide sputtering targets in the end-use industries in developing countries particularly China and India are driving consequently fueling the demand for global complex oxide sputtering target market.


KEY INDUSTRY DEVELOPMENTS:


January 2021- The Mitsubishi Corp. launched a new sputtering target (DIABLA) for blackening films and started mass production.


August 2019- ULVAC, Inc. successfully launched PZT piezoelectric thin-film sputtering technology and a high volume manufacturing (HVM) solution for the development of actuators and MEMS sensors for high-quality film and reliable production for next-generation devices.


Read More Details On This Report:

https://extrapolate.com/Semiconductor-Electronics/complex-oxide-sputtering-target-market/25688

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